Laser annealing apparatus and laser annealing method
文献类型:专利
作者 | TAMI, YOSHIHARU; SOGA, KAZUHIRO; OGINO, YOSHIAKI |
发表日期 | 2015-03-05 |
专利号 | US20150060421A1 |
著作权人 | NVE CORPORATION |
国家 | 美国 |
文献子类 | 发明申请 |
其他题名 | Laser annealing apparatus and laser annealing method |
英文摘要 | Metal is locally heated to a predetermined temperature within a predetermined time. A laser annealing apparatus forms a line beam at a focusing position in a heatable area on a workpiece by an optical system, which has a long and narrow shape having a width of 0.5 μm all to 20 μm in the short direction and a long width of 6 μm to 200 μm in the length direction and has a depth of focus in the range of 2 μm to 4 μm, by using a semiconductor laser element that generates laser light, while moving a movable stage on which the workpiece has been mounted in an X direction and a Y direction; and selectively performs a heating step of performing laser annealing while controlling focusing and second laser power that has an output lower than the output of first laser power in the unheatable area on the workpiece. |
公开日期 | 2015-03-05 |
申请日期 | 2014-05-22 |
状态 | 失效 |
源URL | [http://ir.opt.ac.cn/handle/181661/58932] |
专题 | 半导体激光器专利数据库 |
作者单位 | NVE CORPORATION |
推荐引用方式 GB/T 7714 | TAMI, YOSHIHARU,SOGA, KAZUHIRO,OGINO, YOSHIAKI. Laser annealing apparatus and laser annealing method. US20150060421A1. 2015-03-05. |
入库方式: OAI收割
来源:西安光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。