中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Laser annealing apparatus and laser annealing method

文献类型:专利

作者TAMI, YOSHIHARU; SOGA, KAZUHIRO; OGINO, YOSHIAKI
发表日期2015-03-05
专利号US20150060421A1
著作权人NVE CORPORATION
国家美国
文献子类发明申请
其他题名Laser annealing apparatus and laser annealing method
英文摘要Metal is locally heated to a predetermined temperature within a predetermined time. A laser annealing apparatus forms a line beam at a focusing position in a heatable area on a workpiece by an optical system, which has a long and narrow shape having a width of 0.5 μm all to 20 μm in the short direction and a long width of 6 μm to 200 μm in the length direction and has a depth of focus in the range of 2 μm to 4 μm, by using a semiconductor laser element that generates laser light, while moving a movable stage on which the workpiece has been mounted in an X direction and a Y direction; and selectively performs a heating step of performing laser annealing while controlling focusing and second laser power that has an output lower than the output of first laser power in the unheatable area on the workpiece.
公开日期2015-03-05
申请日期2014-05-22
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/58932]  
专题半导体激光器专利数据库
作者单位NVE CORPORATION
推荐引用方式
GB/T 7714
TAMI, YOSHIHARU,SOGA, KAZUHIRO,OGINO, YOSHIAKI. Laser annealing apparatus and laser annealing method. US20150060421A1. 2015-03-05.

入库方式: OAI收割

来源:西安光学精密机械研究所

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