Method and apparatus for optical coating in wafer fabrication reactors
文献类型：专利
| 作者 | LIXIANG, JIN; CHEN, JIANYU MARTIN; LIM, HWI SIONG; VICTOR TEO, KIAN HIN; LAM, YEE LOY |
| 发表日期 | 2003-10-02 |
| 专利号 | US20030185963A1 |
| 著作权人 | DENSELIGHT SEMICONDUCTORS PTE LTD |
| 国家 | 美国 |
| 文献子类 | 发明申请 |
| 其他题名 | Method and apparatus for optical coating in wafer fabrication reactors |
| 英文摘要 | A method and a carrier frame for coating the facets of semiconductor devices, in which a plurality of bars are stacked so as to form a wafer such that the facets to be coated are exposed. The exposed facets may then be simultaneously coated in a wafer fabrication/deposition reactor to realise the associated time and cost benefits. The carrier comprises a suitable means for containing a plurality of bars and resiliently biased holding means for holding the bars in the stacked position. |
| 公开日期 | 2003-10-02 |
| 申请日期 | 2003-03-18 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/60941]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | DENSELIGHT SEMICONDUCTORS PTE LTD |
| 推荐引用方式 GB/T 7714 | LIXIANG, JIN,CHEN, JIANYU MARTIN,LIM, HWI SIONG,et al. Method and apparatus for optical coating in wafer fabrication reactors. US20030185963A1. 2003-10-02. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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