System and method for performing photothermal measurements and relaxation compensation
文献类型：专利
| 作者 | ROTTER, LAWRENCE D.; WANG, DAVID Y.; SHAUGHNESSY, DERRICK; SENKO, MARK |
| 发表日期 | 2012-05-09 |
| 专利号 | EP2449366A2 |
| 著作权人 | KLA-TENCOR CORPORATION |
| 国家 | 欧洲专利局 |
| 文献子类 | 发明申请 |
| 其他题名 | System and method for performing photothermal measurements and relaxation compensation |
| 英文摘要 | A device and methods for performing a photothermal measurement and relaxation compensation of a sample are disclosed. The device may include a probe beam source, a pump beam source, a sample, and a detector array. A method may include adjusting an intensity modulated pump beam power, adjusting a probe beam power to increase a response measurement location temperature and increase a modulated optical reflectance signal, directing the intensity modulated pump beam and the probe beam along a measurement path to a response measurement location on a sample for periodically exciting a region on the sample, detecting a reflected portion of the probe beam, and calculating an implantation dose. |
| 公开日期 | 2012-05-09 |
| 申请日期 | 2010-06-25 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/62538]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | KLA-TENCOR CORPORATION |
| 推荐引用方式 GB/T 7714 | ROTTER, LAWRENCE D.,WANG, DAVID Y.,SHAUGHNESSY, DERRICK,et al. System and method for performing photothermal measurements and relaxation compensation. EP2449366A2. 2012-05-09. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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