Surface defect inspection with large particle monitoring and laser power control
文献类型:专利
作者 | CUI, STEVE YIFENG; HUANG, JAY (CHUNSHENG); WANG, CHUNHAI; WOLTERS, CHRISTIAN; WHITESIDE, BRET; ROMANOVSKY, ANATOLY; HUANG, CHUANYONG; PETTIBONE, DONALD |
发表日期 | 2018-02-08 |
专利号 | WO2018027010A1 |
著作权人 | KLA-TENCOR CORPORATION |
国家 | 世界知识产权组织 |
文献子类 | 发明申请 |
其他题名 | Surface defect inspection with large particle monitoring and laser power control |
英文摘要 | Methods and systems for reducing illumination intensity while scanning over large particles are presented herein. A surface inspection system determines the presence of a large particle in the inspection path of a primary measurement spot using a separate leading measurement spot. The inspection system reduces the incident illumination power while the large particle is within the primary measurement spot. The primary measurement spot and the leading measurement spot are separately imaged by a common imaging collection objective onto one or more detectors. The imaging based collection design spatially separates the image of the leading measurement spot from the image of the primary measurement spot at one or more wafer image planes. Light detected from the leading measurement spot is analyzed to determine a reduced power time interval when the optical power of the primary illumination beam and the leading illumination beam are reduced. |
公开日期 | 2018-02-08 |
申请日期 | 2017-08-03 |
状态 | 未确认 |
源URL | [http://ir.opt.ac.cn/handle/181661/62573] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | KLA-TENCOR CORPORATION |
推荐引用方式 GB/T 7714 | CUI, STEVE YIFENG,HUANG, JAY ,WANG, CHUNHAI,et al. Surface defect inspection with large particle monitoring and laser power control. WO2018027010A1. 2018-02-08. |
入库方式: OAI收割
来源:西安光学精密机械研究所
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