中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Manufacture of integrated semiconductor device

文献类型:专利

作者FURUYAMA HIDETO; UNNO YOUICHI
发表日期1985-09-09
专利号JP1985175476A
著作权人TOSHIBA KK
国家日本
文献子类发明申请
其他题名Manufacture of integrated semiconductor device
英文摘要PURPOSE:To enhance the arraying accuracy and improve the heat sink of a semiconductor element by bonding a plurality of metal pieces through insulating pieces in a sandwich shape, and then mounting fixedly the element through a solder material. CONSTITUTION:A heat sink body 1 and an insulator 2 are selected to have an equal arraying interval of semiconductor elements in the total of the thicknesses and the solder material. The body 1 and the insulator 2 are bonded with hard brazing material. Then, the solder material is selectively deposited and plated on the body Then, an electric isolation is formed between the elements to form a semiconductor array, which is mounted fixedly on the position of the heat sink body. Thus, the element array is mounted up-side-down. The elements are electrically connected through each of the heat sink body.
公开日期1985-09-09
申请日期1984-02-22
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/62911]  
专题半导体激光器专利数据库
作者单位TOSHIBA KK
推荐引用方式
GB/T 7714
FURUYAMA HIDETO,UNNO YOUICHI. Manufacture of integrated semiconductor device. JP1985175476A. 1985-09-09.

入库方式: OAI收割

来源:西安光学精密机械研究所

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