中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
A method of fabricating a compositional semiconductor device

文献类型:专利

作者NÖTZEL, RICHARD; LEDENTSOV, N. NIKOLAI, DR.; DÄWERITZ, LUTZ, DR.SC.; PLOOG, KLAUS, DR.
发表日期1993-04-07
专利号EP0535293A1
著作权人MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V.
国家欧洲专利局
文献子类发明申请
其他题名A method of fabricating a compositional semiconductor device
英文摘要A method of fabricating a compositional semiconductor device comprising a quantum well wire or quantum dot superlattice structure, in particular a device selected from the group comprising lasers, photodiodes, resonant tunnelling transistors, resonant tunneling diodes, far infrared detectors, far infrared emitters, high electron mobility transistors, solar cells, optical modulators, optically bistable devices and bipolar transistors, by epitaxial growth of the superlattice structure on a semiconductor substrate, is characterised in that the epitaxial growth is effected on a {311}, {211}, {111} or {110} substrate, and that the devices preferably have length and width dimensions less than 500 Å and especially less than 300 Å.
公开日期1993-04-07
申请日期1992-01-21
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/64229]  
专题半导体激光器专利数据库
作者单位MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V.
推荐引用方式
GB/T 7714
NÖTZEL, RICHARD,LEDENTSOV, N. NIKOLAI, DR.,DÄWERITZ, LUTZ, DR.SC.,et al. A method of fabricating a compositional semiconductor device. EP0535293A1. 1993-04-07.

入库方式: OAI收割

来源:西安光学精密机械研究所

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