Multiple quantum well semiconductor laser
文献类型:专利
作者 | KAWABATA TOSHIHARU; ISHIGURO NAGATAKA |
发表日期 | 1989-09-26 |
专利号 | JP1989241884A |
著作权人 | MATSUSHITA ELECTRIC IND CO LTD |
国家 | 日本 |
文献子类 | 发明申请 |
其他题名 | Multiple quantum well semiconductor laser |
英文摘要 | PURPOSE:To realize a long wavelength band multiple quantum well(MQW) semiconductor laser having a low threshold value current by doping a barrier layer of the MQW with acceptors in a specific concentration range. CONSTITUTION:After an N-type InP clad layer 2 is grown on an N-type InP substrate face 1 in a plane (100), InGaAsP well layers 3 each having 200Angstrom of thickness and InP barrier layers 4 each having 200Angstrom of thickness are alternately grown as a MQW active layer, and a P-type InP clad layer 7 is further partly grown thinly. The number of the layers 3 is 6 and the layer is undoped, and the layer 4 is doped with Zn. In order to improve the hole injection efficiency, the Zn doping to the layer 4 is effective, and its optimum Zn concentration ranges from 1X10cm to 2.5X10cm. The Zn concentration is set to this range, thereby manufacturing long wavelength band MQW laser having a low threshold value current. |
公开日期 | 1989-09-26 |
申请日期 | 1988-03-24 |
状态 | 失效 |
源URL | [http://ir.opt.ac.cn/handle/181661/64413] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | MATSUSHITA ELECTRIC IND CO LTD |
推荐引用方式 GB/T 7714 | KAWABATA TOSHIHARU,ISHIGURO NAGATAKA. Multiple quantum well semiconductor laser. JP1989241884A. 1989-09-26. |
入库方式: OAI收割
来源:西安光学精密机械研究所
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