中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
MBE System and semiconductor device fabricated using same

文献类型:专利

作者TAMAMURA, KOSHI, C/O SONY CORP.; TSUKAMOTO, HIRONORI, C/O SONY CORP.; IKEDA, MASAO, C/O SONY CORP.
发表日期1996-09-18
专利号EP0702101A3
著作权人SONY CORPORATION
国家欧洲专利局
文献子类发明申请
其他题名MBE System and semiconductor device fabricated using same
英文摘要A molecular beam epitaxy system having a plurality of chambers which contain at least a first chamber and a second chamber. The first chamber is used to form II-V column compound semiconductor layers not containing Te. The second chamber is used to form II-V column compound semiconductor layers containing at least Te. A semiconductor device having an ohmic characteristics can be fabricated without mixing Te into other layers.
公开日期1996-09-18
申请日期1995-09-13
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/67229]  
专题半导体激光器专利数据库
作者单位SONY CORPORATION
推荐引用方式
GB/T 7714
TAMAMURA, KOSHI, C/O SONY CORP.,TSUKAMOTO, HIRONORI, C/O SONY CORP.,IKEDA, MASAO, C/O SONY CORP.. MBE System and semiconductor device fabricated using same. EP0702101A3. 1996-09-18.

入库方式: OAI收割

来源:西安光学精密机械研究所

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