中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Radiation-emitting semiconductor device and method of manufacturing such a semiconductor device

文献类型:专利

作者VALSTER, ADRIAAN
发表日期1990-10-03
专利号EP0390262A1
著作权人CAMBIO RAGIONE SOCIALE ; PHILIPS ELECTRONICS N.V.
国家欧洲专利局
文献子类发明申请
其他题名Radiation-emitting semiconductor device and method of manufacturing such a semiconductor device
英文摘要Radiation-emitting semiconductor diodes in the form of a laser diode or in the form of a LED form important components in data-processing systems. There is especially need of diodes which emit in the visible part of the spectrum, which have a low starting current and which can be manufactured at low cost. A radiation-emitting semiconductor diode comprising above the active layer a cladding layer and a GaAs contact layer, into which a mesa-shaped strip is etched, and provided on the upper and the lower side with a conductive layer, which forms outside the mesa-shaped strip a junction forming a barrier with a subjacent semiconductor layer, partly satisfies the aforementioned requirements. According to the invention, such a diode comprises an active layer and cladding layers, which comprise (Al) GaInP, and an intermediate layer between the cladding layer and the contact layer, which extends outside the mesa-shaped strip and forms at these areas current-limiting regions due to the junction forming a barrier with the conducting layer. This intermediate layer offers the possibility to optimize the barrier effect, independently of the properties of the remaining semiconductor layers. The intermediate layer can comprise InGaP, InAlGaP or AlGaAs. The invention also relates to a method of manufacturing such a radiation-emitting semiconductor diode, which is very simple and inexpensive.
公开日期1990-10-03
申请日期1990-03-22
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/67434]  
专题半导体激光器专利数据库
作者单位1.PHILIPS ELECTRONICS N.V.
2.CAMBIO RAGIONE SOCIALE
推荐引用方式
GB/T 7714
VALSTER, ADRIAAN. Radiation-emitting semiconductor device and method of manufacturing such a semiconductor device. EP0390262A1. 1990-10-03.

入库方式: OAI收割

来源:西安光学精密机械研究所

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