Manufacture of phase shifting diffraction grating
文献类型：专利
| 作者 | ONO YUZO |
| 发表日期 | 1987-09-18 |
| 专利号 | JP1987212606A |
| 著作权人 | NEC CORP |
| 国家 | 日本 |
| 文献子类 | 发明申请 |
| 其他题名 | Manufacture of phase shifting diffraction grating |
| 英文摘要 | PURPOSE:To obtain a phase shifting diffraction grating which is small in the transition area of a phase shifting part and has an optional period by generating a wave front by using the principle of holography so that one piece of luminous flux has a wave front shifted in phase on an interference surface. CONSTITUTION:A phase plate 1 which makes a desired phase shift is irradiated with parallel light 2 which is vertically perpendicular and the parallel light is made to interfere with parallel reference light 4, thereby recording the 1st hologram on a photosensitive body layer 5. The 1st hologram 7 is irradiated from the reverse surface with parallel light 8 conjugate to parallel light 4 during manufacture and made to interfere with parallel reference light 12, thereby recording the 2nd hologram on a photosensitive body layer 11 on a quartz substrate 10. The 2nd hologram 13 is irradiated from the reverse surface with a plane wave 14 and made to interfere with parallel reference light 18, thereby recording the 3rd hologram on a photosensitive body layer 17. The 3rd hologram 19 is irradiated from the reverse surface wit parallel light 20 conjugate to reference light 18 during the manufacture and a wafer 23 coated with photoresist 22 is placed; and the light is made to interfere with the other piece of interference luminous flux 24, thus forming a phase shift diffraction grating. |
| 公开日期 | 1987-09-18 |
| 申请日期 | 1986-03-14 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/67560]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | NEC CORP |
| 推荐引用方式 GB/T 7714 | ONO YUZO. Manufacture of phase shifting diffraction grating. JP1987212606A. 1987-09-18. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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