Production method of iii nitride compound semiconductor substrate and semiconductor device
文献类型：专利
| 作者 | KOIKE, MASAYOSHI; NAGAI, SEIJI; TEZEN, YUTA |
| 发表日期 | 2001-11-08 |
| 专利号 | WO2001084608A1 |
| 著作权人 | TOYODA GOSEI CO., LTD. |
| 国家 | 世界知识产权组织 |
| 文献子类 | 发明申请 |
| 其他题名 | Production method of iii nitride compound semiconductor substrate and semiconductor device |
| 英文摘要 | A GaN layer (31) is etched in an insular shape, such as a dot, stripe or lattice, to provide steps with the bottoms thereof serving as recesses in a base substrate (1). Then, GaN (32) is epitaxial-grown laterally with the top and side surfaces of the upper treads of steps as nuclei to thereby bury portions above the lower treads (recesses in the base substrate (1)) of the steps and then grow them upward. Portions above the laterally epitaxial-grown portions of the GaN (32) are defined as areas where the propagation of penetration dislocation of the GaN layer (31) is restrained. Then, the remaining portions of the GaN layer (31) are etched and removed together with the upper-layer GaN (32), and GaN (33) is laterally epitaxial-grown with the remaining top surfaces and side surfaces of the upper treads of the GaN layer (32) as nuclei to thereby provide a GaN substrate (30) having penetration dislocation significantly restrained. The GaN substrate (30) having a small contact surface (GaN layer (31)) with the base substrate (1) can be easily separated. |
| 公开日期 | 2001-11-08 |
| 申请日期 | 2001-03-02 |
| 状态 | 未确认 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/67834]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | TOYODA GOSEI CO., LTD. |
| 推荐引用方式 GB/T 7714 | KOIKE, MASAYOSHI,NAGAI, SEIJI,TEZEN, YUTA. Production method of iii nitride compound semiconductor substrate and semiconductor device. WO2001084608A1. 2001-11-08. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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