Method for manufacturing semiconductor optical device
文献类型：专利
| 作者 | OKA, TAKAFUMI; ABE, SHINJI |
| 发表日期 | 2009-09-08 |
| 专利号 | US7585688 |
| 著作权人 | MITSUBISHI ELECTRIC CORPORATION |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | Method for manufacturing semiconductor optical device |
| 英文摘要 | A method for manufacturing a semiconductor optical device includes: forming a first resist pattern on a top surface of a laminated semiconductor structure; forming channels and a waveguide ridge by dry etching using the first resist pattern as a mask; forming an SiO2 film on the waveguide ridge and the channels, leaving the first resist pattern on a top surface of the waveguide ridge; forming a second resist pattern covering the SiO2 film on the channels, and exposing the top surface of the SiO2 film on top of the waveguide ridge; removing the SiO2 film by dry etching using the second resist pattern as a mask; removing the first and second resist patterns by a wet method; and forming a p-side electrode. |
| 公开日期 | 2009-09-08 |
| 申请日期 | 2008-02-28 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/73716]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | MITSUBISHI ELECTRIC CORPORATION |
| 推荐引用方式 GB/T 7714 | OKA, TAKAFUMI,ABE, SHINJI. Method for manufacturing semiconductor optical device. US7585688. 2009-09-08. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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