中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor device

文献类型:专利

作者OGURA MOTOTSUGU; YOKOGAWA TOSHIYA; TAKAHASHI YASUHITO
发表日期1988-02-05
专利号JP1988028065A
著作权人MATSUSHITA ELECTRIC IND CO LTD
国家日本
文献子类发明申请
其他题名Semiconductor device
英文摘要PURPOSE:To obtain good matching of Si for a manufacturing process and reduce cost, by laminating distorted super lattice layers comprising two or more species of II-VI semiconductors on a surface which is formed on one main surface of a semiconductor substrate and which contains insulating materials and metallic materials. CONSTITUTION:By organic metal vapor growth method (MOVPE method), for example, a distorted super-lattice 8 made of ZnTe and CdTe is formed as a base of single crystal epitaxy, and then hetero junction comprising single- crystal thin films 9 and 10 made of p-type ZnCdTe and n-type ZnSe is formed thereon. Because both ZnCdTe and ZnSe on this groove are single crystals, and not shaped in ice columns, they have no trouble on water and organic washing, without their remnants generated by removal of photo-resist, so that this processing can be pretty easily done. Besides, sensitivity, because of single crystal, becomes extremely high, and this device becomes twice or more excellent in characteristics compared with the conventional ones.
公开日期1988-02-05
申请日期1986-07-22
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/75012]  
专题半导体激光器专利数据库
作者单位MATSUSHITA ELECTRIC IND CO LTD
推荐引用方式
GB/T 7714
OGURA MOTOTSUGU,YOKOGAWA TOSHIYA,TAKAHASHI YASUHITO. Semiconductor device. JP1988028065A. 1988-02-05.

入库方式: OAI收割

来源:西安光学精密机械研究所

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