中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor light-emitting device

文献类型:专利

作者FURUYA AKIRA; MAKIUCHI MASAO
发表日期1988-11-25
专利号JP1988288083A
著作权人FUJITSU LTD
国家日本
文献子类发明申请
其他题名Semiconductor light-emitting device
英文摘要PURPOSE:To obtain a device, in which electrodes are led out easily and which has excellent characteristics, by forming p-type and n-type conductive regions reaching a first clad layer from the surface of a semiconductor base body and oppositely facing through superlattice structure and the electrodes respectively brought into contact with the p-type and n-type conductive regions on the surface of the base body. CONSTITUTION:A high-resistance Al0.45Ga0.55As clad layer 1', superlattice structure 2, a high-resistance Al0.45Ga0.55As clad layer 1, and an n-type GaAs cap layer 4 are epitaxial-grown onto a semi-insulating GaAs substrate 10 in succession. In the superlattice structure 2, p-type layers 2Bp, in which beryllium (Be) is doped to Al0.3 Ga0.7As layers, and n-type layers 2Bn, in which silicon (Si) is doped to the Al0.3Ga0.7As layers, are shaped alternately as barrier layers, and non-doped GaAs active layers 2A are formed among both layers 2Bp and 2Bn. A p side electrode 9p is disposed onto the p-type conductive region 5p and an n side electrode 9n onto an n-type conductive region 5n. Holes are injected to an active layer 2A through the p-type barrier layer 2Bp from the p-type conductive region 5p and electrons through the n-type barrier layer 2Bn from the n-type conductive region 5n. Accordingly, constraint by the diffusion length of carriers is not conducted, and the range of selection of a distance between the p-type conductive region 5p and the n-type conductive region 5n is increased.
公开日期1988-11-25
申请日期1987-05-20
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/75818]  
专题半导体激光器专利数据库
作者单位FUJITSU LTD
推荐引用方式
GB/T 7714
FURUYA AKIRA,MAKIUCHI MASAO. Semiconductor light-emitting device. JP1988288083A. 1988-11-25.

入库方式: OAI收割

来源:西安光学精密机械研究所

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