Semiconductor laser
文献类型:专利
作者 | SAKIYAMA HAJIME; TANAKA HARUO; MUSHIGAMI MASAHITO |
发表日期 | 1990-08-01 |
专利号 | JP1990194681A |
著作权人 | ROHM CO LTD |
国家 | 日本 |
文献子类 | 发明申请 |
其他题名 | Semiconductor laser |
英文摘要 | PURPOSE:To reduce a forward voltage by a method wherein a lower clad layer, an active layer, a first upper clad layer, a photo absorption layer and an evaporation preventive layer are laminated, a striped groove to reach the first clad layer is bored and when the groove is covered with a second upper clad layer, the first clad layer is formed into a structure consisting of two layers, which respectively have a high carrier concentration and a low carrier concentration. CONSTITUTION:An N-type AlxGa1-xAs (x=0.6) lower clad layer 3, an AlxGa1-xAs (x=0.15) active layer 4, a first upper clad layer 5, an N-type GaAs photo absorption layer 6 and an N-type AlxGa1-xAs (x=0.15) evaporation preventive layer 7 are laminated in order on an N-type GaAs substrate 2. At this time, the layer 5 is formed into a double constitution consisting of a P-type AlxGa1-xAs (x=0.6) lower layer 5a and a P AlxGa1-xAs upper layer 5b and a carrier concentration in the layer 5b is kept higher than that in the layer 5a. After this, a striped groove 9 is formed from the layer 7 down to the layer 5 and a P-type AlyGa1-yAs second upper clad layer 10 is provided on the layer 7 including this groove 9. In such a way, a series resistance is kept low by the layer 5b. |
公开日期 | 1990-08-01 |
申请日期 | 1989-01-24 |
状态 | 失效 |
源URL | [http://ir.opt.ac.cn/handle/181661/75955] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | ROHM CO LTD |
推荐引用方式 GB/T 7714 | SAKIYAMA HAJIME,TANAKA HARUO,MUSHIGAMI MASAHITO. Semiconductor laser. JP1990194681A. 1990-08-01. |
入库方式: OAI收割
来源:西安光学精密机械研究所
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