Semiconductor laser element
文献类型:专利
作者 | IWAI NORIHIRO; IJICHI TETSURO; MATSUMOTO SHIGETO |
发表日期 | 1992-04-13 |
专利号 | JP1992111375A |
著作权人 | FURUKAWA ELECTRIC CO LTD:THE |
国家 | 日本 |
文献子类 | 发明申请 |
其他题名 | Semiconductor laser element |
英文摘要 | PURPOSE:To simplify a manufacturing process by a method wherein an electrode which is ohmic-joined to a contact layer and which is Schottky-joined to a clad layer is laminated on the clad layer and the contact layer. CONSTITUTION:An n-InGaP clad layer 2, an InGaAs/GaAs strain quantum well active layer 3, a p-InGaP clad layer 4 and a p-InGaAs contact layer 5 are laminated sequentially on an n-GaAs substrate 1 by an MOCVD method. An etching operation is executed down to a halfway part of the p-InGaP clad layer 4 by a photolithographic method or the like; a mesa is formed; after that, Ti/Pt/Au is vapor-deposited as a p-electrode 7 and Au-Ge-Ni/Au is vapor-deposited sequentially as an n-electrode 8. When an electric current flows to an element manufactured in this manner, a Schottky junction part 9 is formed between the p-InGaP clad layer 4 and the p-electrode 7, the electric current flows only between the p-electrode and the p-InGaAs contact layer 5 and the electric current is constricted. |
公开日期 | 1992-04-13 |
申请日期 | 1990-08-30 |
状态 | 失效 |
源URL | [http://ir.opt.ac.cn/handle/181661/76212] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | FURUKAWA ELECTRIC CO LTD:THE |
推荐引用方式 GB/T 7714 | IWAI NORIHIRO,IJICHI TETSURO,MATSUMOTO SHIGETO. Semiconductor laser element. JP1992111375A. 1992-04-13. |
入库方式: OAI收割
来源:西安光学精密机械研究所
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