中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Manufacture of semiconductor laser device

文献类型:专利

作者NIDOU MASAAKI; SAKUMA ISAMU
发表日期1985-08-23
专利号JP1985161688A
著作权人NIPPON DENKI KK
国家日本
文献子类发明申请
其他题名Manufacture of semiconductor laser device
英文摘要PURPOSE:To provide a semiconductor laser device which has high mass productivity and makes possible to do high light-output operation, by including a second vapor phase epitaxy process which forms a fifth semiconductor layer of a second conductive type having a larger band gap than the active layer on substrate crystal with a groove formed. CONSTITUTION:A mask for etching which has windows aligned in the direction is formed on the surface of the N type GaAs layer 5, and a concave 13 reaching the N type Al0.35Ga0.65As layer 2 is formed by means of etching. Next, a mask 14 for etching which has belt-form windows 15 formed so as to connect the windows 12, is formed. To form a groove 16, the N type GaAs layer 5 is selectively removed with etching. Next, a P type Al0.35Ga0.65As layer 7 is formed as a fifth semiconductor layer having a larger band gap than the active layer 3, and thereon a P type GaAs layer 8 is formed. Thereafter, a P type electrode 9 and an N type electrode 10 are formed. Lastly, it is cut into discrete chips on the cutting line passing through the center of the windows 12 perpendicular to the direction to complete a semiconductor laser device.
公开日期1985-08-23
申请日期1984-02-02
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/76367]  
专题半导体激光器专利数据库
作者单位NIPPON DENKI KK
推荐引用方式
GB/T 7714
NIDOU MASAAKI,SAKUMA ISAMU. Manufacture of semiconductor laser device. JP1985161688A. 1985-08-23.

入库方式: OAI收割

来源:西安光学精密机械研究所

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