中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor device and its manufacture

文献类型:专利

作者YASUAMI SHIGERU
发表日期1992-02-14
专利号JP1992045577A
著作权人TOSHIBA CORP
国家日本
文献子类发明申请
其他题名Semiconductor device and its manufacture
英文摘要PURPOSE:To set polycrystal or an amorphous region arbitrarily in a lamination which is acquired by epitaxial growth by providing a second semiconductor layer which is formed including a semiconductor layer whose lattice constant is different from that of a semiconductor layer. CONSTITUTION:Conventional surface pretreatment is performed for a silicon substrate 3 Fixing of dangling bond is performed for a region 32 wherein polycrystal is made to grow by a substance of low surface activity such as oxygen atom using STM. Thereafter, a thin film wherein a single crystal region 33a and a polycrystal region 33b coexist can be acquired by forming silicon by use of silane. A realized region of single crystal 33a and polycrystal 33b is arranged periodically two-dimensionally or three-dimensionally.
公开日期1992-02-14
申请日期1990-06-13
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/76437]  
专题半导体激光器专利数据库
作者单位TOSHIBA CORP
推荐引用方式
GB/T 7714
YASUAMI SHIGERU. Semiconductor device and its manufacture. JP1992045577A. 1992-02-14.

入库方式: OAI收割

来源:西安光学精密机械研究所

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