Manufacture of diffraction grating
文献类型：专利
| 作者 | KIMURA YASUO; ONO YUZO |
| 发表日期 | 1990-02-27 |
| 专利号 | JP1990058284A |
| 著作权人 | NEC CORP |
| 国家 | 日本 |
| 文献子类 | 发明申请 |
| 其他题名 | Manufacture of diffraction grating |
| 英文摘要 | PURPOSE:To obtain a manufacturing method for diffraction grating for DFB laser, lambda/4 shift DFB laser, etc., which are stable, excellent in mass-productivity, and does not require much manhour by making the grating by coherent transfer method using a grating pattern composed of photo-setting resin made by using a substrate on which the grating pattern is transferred, as an original plate. CONSTITUTION:A grating is made by the following manner: a grating formed on a resist layer 20 on a substrate 19 is transferred to a substrate 19; the substrate 19, to which the grating pattern is transferred, is used as an original plate, and by using photo-setting resin, a duplicate of the above grating pattern is made; the grating is formed by coherent transfer method using the grating pattern composed of photo-setting resin 2 For example, by two-light-fluxes interference method, the grating having a desired pitch is made on a photoresist layer 20 on the substrate 19; by using the grating composed of photoresist as a mask, the substrate 19 is etched, and the grating pattern is transferred to the substrate 19; by using the pattern on the substrate 19 as an original plate, a replica is made of the photo-setting resin 21; by using the grating transferred to the photo-setting resin 21 as a basic diffraction grating, coherent transfer on a semiconductor laser substrate is performed. |
| 公开日期 | 1990-02-27 |
| 申请日期 | 1988-08-24 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/76715]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | NEC CORP |
| 推荐引用方式 GB/T 7714 | KIMURA YASUO,ONO YUZO. Manufacture of diffraction grating. JP1990058284A. 1990-02-27. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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