中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Superlattice structure semiconductor device

文献类型:专利

作者MITSUYU TSUNEO; OKAWA KAZUHIRO; KARASAWA TAKESHI
发表日期1991-01-29
专利号JP1991020096A
著作权人MATSUSHITA ELECTRIC IND CO LTD
国家日本
文献子类发明申请
其他题名Superlattice structure semiconductor device
英文摘要PURPOSE:To acquire good electrical and optical performance by providing a superlattice layer which is formed by laminating a plurality of thin zinc sulfide layers and thin zinc telluride layers on a buffer layer alternatively. CONSTITUTION:A device is composed of an indium phosphate single crystalline substrate 1, a superlattice layer 2 which is formed by laminating a plurality of zinc sulfide layers 2a and zinc telluride layers 2b, and a buffer layer which is formed by making epitaxial growth of cadmium sulfide. In this case, a lattice constant of cadmium sulfide approximately coincides with that of indium phosphorus or a substrate, which enables good epitaxial growth. The cadmium sulfide buffer layer 3 also shows a tendency of three dimensional island-shape growth immediately after beginning of growth; however, after a growth of several tens of Angstrom or more, it shifts to a two dimensional growth and a flat surface can be acquired at an atomic level. As a result, the superlattice layer 2 which has a grown on the buffer layer 3 grows two-dimensionally just after beginning of growth and a good and flat superlattice without defects can be acquired. Good electrical and optical characteristics can be realized in this way.
公开日期1991-01-29
申请日期1989-06-16
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/77460]  
专题半导体激光器专利数据库
作者单位MATSUSHITA ELECTRIC IND CO LTD
推荐引用方式
GB/T 7714
MITSUYU TSUNEO,OKAWA KAZUHIRO,KARASAWA TAKESHI. Superlattice structure semiconductor device. JP1991020096A. 1991-01-29.

入库方式: OAI收割

来源:西安光学精密机械研究所

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