中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
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文献类型:专利

作者MOGI NAOTO; WATANABE YUKIO; SHIMADA NAOHIRO
发表日期1992-08-12
专利号JP1992049792B2
著作权人TOKYO SHIBAURA ELECTRIC CO
国家日本
文献子类授权发明
其他题名-
英文摘要PURPOSE:To contrive to reduce the threshold value by enabling the reduction of the reactive current flowing through an active layer on both sides of a stripe groove part by a method wherein a p type inversion layer is formed in an n type clad layer. CONSTITUTION:An n type clad layer 12, active layer 13 and a p type clad layer 14 are successively grown on an n type compound semiconductor substrate 11, resulting in the formation of a double hetero junction. Besides, an n type current block layer 15 grown and formed on the clad layer 14 and provided with the stripe groove reaching the clad layer 14 and a p type coat layer 16 grown and formed on the block layer by including the groove are furnished. Then, the part of the clad layer 12 except for the region immediately under the stripe groove and in contact with the active layer is inverted into p type.
公开日期1992-08-12
申请日期1983-09-22
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/78892]  
专题半导体激光器专利数据库
作者单位TOKYO SHIBAURA ELECTRIC CO
推荐引用方式
GB/T 7714
MOGI NAOTO,WATANABE YUKIO,SHIMADA NAOHIRO. -. JP1992049792B2. 1992-08-12.

入库方式: OAI收割

来源:西安光学精密机械研究所

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