中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Manufacture of semiconductor laser

文献类型:专利

作者TAKAHASHI SHOGO; KONO MINORU
发表日期1992-02-19
专利号JP1992049692A
著作权人MITSUBISHI ELECTRIC CORP
国家日本
文献子类发明申请
其他题名Manufacture of semiconductor laser
英文摘要PURPOSE:To eliminate a need for a high-temperature driving process by a method wherein a diffusion operation is executed under a condition that the concentration of a diffusion source is reduced with the diffusion time, a low-concentration p-type diffusion region is formed, a diffusion operation is executed under a condition that the concentration of a diffusion source becomes definite with respect to the diffusion time and a p-type high-concentration diffusion region is formed at the inside of the p-type low-concentration diffusion region. CONSTITUTION:An Si3N4 film 3 for mask use is formed, by a thermal CVD method, on an Ink-based n-type epitaxial layer which in grown on an InP substrate; and a condition that the concentration of a diffusion source is reduced with the diffusion time is obtained by a sputtering operation. In addition, a first ZnO film 4 as a diffusion source is formed; and after that, a first SiO2 film 5 as a cap layer is formed by a sputtering operation in the same manner. Then, a thermal diffusion operation is executed; and a p-type low-concentration diffusion region 6 whose carrier concentration is at about 10cm is formed. The diffusion source 4 and the cap layer 5 are removed; and after that, a second ZnO film 7 as a diffusion source and a second SiO2 film 8 as a cap layer are formed by a sputtering operation. Then, a thermal diffusion operation is executed; and a p-type high-concentration diffusion region 9 whose carrier concentration is at about 10cm is formed on the inside of the p-type low-concentration region 6.
公开日期1992-02-19
申请日期1990-06-18
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/81480]  
专题半导体激光器专利数据库
作者单位MITSUBISHI ELECTRIC CORP
推荐引用方式
GB/T 7714
TAKAHASHI SHOGO,KONO MINORU. Manufacture of semiconductor laser. JP1992049692A. 1992-02-19.

入库方式: OAI收割

来源:西安光学精密机械研究所

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