中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor devices

文献类型:专利

作者OHISHI, AKIO; KURODA, TAKAO; TSUJI, SHINJI; HIRAO, MOTOHISA; MATSUMURA, HIROYOSHI
发表日期1990-02-27
专利号US4905057
著作权人HITACHI, LTD.
国家美国
文献子类授权发明
其他题名Semiconductor devices
英文摘要A semiconductor device such as a semiconductor laser device or a transistor which is small in both threshold current and leakage current and exhibits no increase with time in the threshold current and leakage current can be obtained by incorporating pnp or npn junctions in a buried layer which coats an active region containing InGaAsP, forming the mid layer of the junctions with InGaAsP, adjusting the conductivity type of the mid layer with an implanted ion and specifying the energy band width of a semiconductor constituting the mid layer.
公开日期1990-02-27
申请日期1989-03-17
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/82123]  
专题半导体激光器专利数据库
作者单位HITACHI, LTD.
推荐引用方式
GB/T 7714
OHISHI, AKIO,KURODA, TAKAO,TSUJI, SHINJI,et al. Semiconductor devices. US4905057. 1990-02-27.

入库方式: OAI收割

来源:西安光学精密机械研究所

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