中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Manufacture of monolithic semiconductor laser array with two wavelengths

文献类型:专利

作者FUKUNAGA TOSHIAKI; WATANABE AKIRA; YAMADA TOMOYUKI; SANO KAZUYA
发表日期1986-01-16
专利号JP1986008984A
著作权人OKI DENKI KOGYO KK
国家日本
文献子类发明申请
其他题名Manufacture of monolithic semiconductor laser array with two wavelengths
英文摘要PURPOSE:To simplify the manufacturing processes extremely in comparison with the case requiring the conventional zinc diffusing process and to shorten the manufacturing time period, by incorporating an inner-current constrictive layer by two liquid phase epitaxial growths. CONSTITUTION:A p-GaAs substrate 1 is prepared. A mesa-stripe shaped wide first protruded part 2 and a narrow second protruded part 3 are formed. A width W1 is made to be -10mum. A width W2 is set at the optimum value corresponding to the applications of a laser array to be manufactured. The height of d1 of the stripe is set at -5mum. The interval between both protruded parts 2 and 3 is determined so that two laser elements are formed and can be separated to each other. Then, on the substrate 1 having the protruded parts and recess parts, an n-GaAs layer 6, which is used as a current constrictive layer, is grown by the first liquid phase epitaxial growth. Then, the surface is made flat. In this GaAs layer 6, diffusion of minority carriers caused by oscillating light is prevented, and the function of the current constriction can be imparted.
公开日期1986-01-16
申请日期1984-06-23
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/82929]  
专题半导体激光器专利数据库
作者单位OKI DENKI KOGYO KK
推荐引用方式
GB/T 7714
FUKUNAGA TOSHIAKI,WATANABE AKIRA,YAMADA TOMOYUKI,et al. Manufacture of monolithic semiconductor laser array with two wavelengths. JP1986008984A. 1986-01-16.

入库方式: OAI收割

来源:西安光学精密机械研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。