Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)]
文献类型：期刊论文
| 作者 | Huttunen-Saarivirta, E.; Rajala, P.; Carpen, L.; Wang, J.; Liu, F.; Ghanbari, E.; Mao, F.; Dong, C.; Yang, J.; Sarifi-Asl, S. |
| 刊名 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY
 |
| 出版日期 | 2019 |
| 卷号 | 166期号:10页码:Y17-Y26 |
| 关键词 | POINT-DEFECT MODEL CARBON-STEEL CORROSION CHLORIDE SULFIDE GROWTH BREAKDOWN |
| DOI | 10.1149/2.0771910jes |
| 英文摘要 | Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)] |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/18231]  |
| 专题 | 2019专题 |
| 作者单位 | Macdonald, DD (reprint author), Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94709 USA. |
| 推荐引用方式 GB/T 7714 | Huttunen-Saarivirta, E.,Rajala, P.,Carpen, L.,et al. Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)][J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY,2019,166(10):Y17-Y26. |
| APA | Huttunen-Saarivirta, E..,Rajala, P..,Carpen, L..,Wang, J..,Liu, F..,...&Macdonald, D. D..(2019).Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)].JOURNAL OF THE ELECTROCHEMICAL SOCIETY,166(10),Y17-Y26. |
| MLA | Huttunen-Saarivirta, E.,et al."Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)]".JOURNAL OF THE ELECTROCHEMICAL SOCIETY 166.10(2019):Y17-Y26. |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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