Improving Negative-Bias-Temperature-Stress Stability for Thin-Film Transistors by Doping Mg Into ScInO Semiconductor
文献类型:期刊论文
作者 | Lan, Linfeng; Dai, Xingqiang; He, Changchun; Liu, Lu; Yang, Xiaobao; Liang, Lingyan; Cao, Hongtao; Peng, Junbiao |
刊名 | IEEE TRANSACTIONS ON ELECTRON DEVICES
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出版日期 | 2019 |
卷号 | 66期号:6页码:2620-2623 |
关键词 | INSTABILITY |
DOI | 10.1109/TED.2019.2911635 |
英文摘要 | Improving Negative-Bias-Temperature-Stress Stability for Thin-Film Transistors by Doping Mg Into ScInO Semiconductor |
源URL | [http://ir.nimte.ac.cn/handle/174433/18262] ![]() |
专题 | 2019专题 |
作者单位 | Lan, LF (reprint author), South China Univ Technol, State Key Lab Luminescent Mat & Devices, Guangzhou 510640, Guangdong, Peoples R China. |
推荐引用方式 GB/T 7714 | Lan, Linfeng,Dai, Xingqiang,He, Changchun,et al. Improving Negative-Bias-Temperature-Stress Stability for Thin-Film Transistors by Doping Mg Into ScInO Semiconductor[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES,2019,66(6):2620-2623. |
APA | Lan, Linfeng.,Dai, Xingqiang.,He, Changchun.,Liu, Lu.,Yang, Xiaobao.,...&Peng, Junbiao.(2019).Improving Negative-Bias-Temperature-Stress Stability for Thin-Film Transistors by Doping Mg Into ScInO Semiconductor.IEEE TRANSACTIONS ON ELECTRON DEVICES,66(6),2620-2623. |
MLA | Lan, Linfeng,et al."Improving Negative-Bias-Temperature-Stress Stability for Thin-Film Transistors by Doping Mg Into ScInO Semiconductor".IEEE TRANSACTIONS ON ELECTRON DEVICES 66.6(2019):2620-2623. |
入库方式: OAI收割
来源:宁波材料技术与工程研究所
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