Role of Oxygen Vacancies at the TiO2/HfO2 Interface in Flexible Oxide-Based Resistive Switching Memory
文献类型:期刊论文
作者 | Zhang, Rulin; Huang, Hong; Xia, Qing; Ye, Cong; Wei, Xiaodi; Wang, Jinzhao; Zhang, Li; Zhu, Li Qiang |
刊名 | ADVANCED ELECTRONIC MATERIALS
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出版日期 | 2019 |
卷号 | 5期号:5 |
关键词 | INDIUM-TIN-OXIDE |
DOI | 10.1002/aelm.201800833 |
英文摘要 | Role of Oxygen Vacancies at the TiO2/HfO2 Interface in Flexible Oxide-Based Resistive Switching Memory |
源URL | [http://ir.nimte.ac.cn/handle/174433/18336] ![]() |
专题 | 2019专题 |
作者单位 | 1.Zhu, LQ (reprint author), Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Key Lab Graphene Technol & Applicat Zhejiang Prov, Ningbo 315201, Zhejiang, Peoples R China. 2.Zhu, LQ (reprint author), Univ Chinese Acad Sci, Beijing 100049, Peoples R China. 3.Ye, C (reprint author), Hubei Univ, Fac Phys & Elect Sci, Hubei Key Lab Appl Math, Hubei Key Lab Ferroelect & Dielect Mat & Devices, Wuhan 430062, Hubei, Peoples R China. |
推荐引用方式 GB/T 7714 | Zhang, Rulin,Huang, Hong,Xia, Qing,et al. Role of Oxygen Vacancies at the TiO2/HfO2 Interface in Flexible Oxide-Based Resistive Switching Memory[J]. ADVANCED ELECTRONIC MATERIALS,2019,5(5). |
APA | Zhang, Rulin.,Huang, Hong.,Xia, Qing.,Ye, Cong.,Wei, Xiaodi.,...&Zhu, Li Qiang.(2019).Role of Oxygen Vacancies at the TiO2/HfO2 Interface in Flexible Oxide-Based Resistive Switching Memory.ADVANCED ELECTRONIC MATERIALS,5(5). |
MLA | Zhang, Rulin,et al."Role of Oxygen Vacancies at the TiO2/HfO2 Interface in Flexible Oxide-Based Resistive Switching Memory".ADVANCED ELECTRONIC MATERIALS 5.5(2019). |
入库方式: OAI收割
来源:宁波材料技术与工程研究所
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