中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Role of Oxygen Vacancies at the TiO2/HfO2 Interface in Flexible Oxide-Based Resistive Switching Memory

文献类型:期刊论文

作者Zhang, Rulin; Huang, Hong; Xia, Qing; Ye, Cong; Wei, Xiaodi; Wang, Jinzhao; Zhang, Li; Zhu, Li Qiang
刊名ADVANCED ELECTRONIC MATERIALS
出版日期2019
卷号5期号:5
关键词INDIUM-TIN-OXIDE
DOI10.1002/aelm.201800833
英文摘要Role of Oxygen Vacancies at the TiO2/HfO2 Interface in Flexible Oxide-Based Resistive Switching Memory
源URL[http://ir.nimte.ac.cn/handle/174433/18336]  
专题2019专题
作者单位1.Zhu, LQ (reprint author), Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Key Lab Graphene Technol & Applicat Zhejiang Prov, Ningbo 315201, Zhejiang, Peoples R China.
2.Zhu, LQ (reprint author), Univ Chinese Acad Sci, Beijing 100049, Peoples R China.
3.Ye, C (reprint author), Hubei Univ, Fac Phys & Elect Sci, Hubei Key Lab Appl Math, Hubei Key Lab Ferroelect & Dielect Mat & Devices, Wuhan 430062, Hubei, Peoples R China.
推荐引用方式
GB/T 7714
Zhang, Rulin,Huang, Hong,Xia, Qing,et al. Role of Oxygen Vacancies at the TiO2/HfO2 Interface in Flexible Oxide-Based Resistive Switching Memory[J]. ADVANCED ELECTRONIC MATERIALS,2019,5(5).
APA Zhang, Rulin.,Huang, Hong.,Xia, Qing.,Ye, Cong.,Wei, Xiaodi.,...&Zhu, Li Qiang.(2019).Role of Oxygen Vacancies at the TiO2/HfO2 Interface in Flexible Oxide-Based Resistive Switching Memory.ADVANCED ELECTRONIC MATERIALS,5(5).
MLA Zhang, Rulin,et al."Role of Oxygen Vacancies at the TiO2/HfO2 Interface in Flexible Oxide-Based Resistive Switching Memory".ADVANCED ELECTRONIC MATERIALS 5.5(2019).

入库方式: OAI收割

来源:宁波材料技术与工程研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。