Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films
文献类型：期刊论文
| 作者 | Liu, Sida; Chang, Keke; Mraz, Stanislav; Chen, Xiang; Hans, Marcus; Music, Denis; Primetzhofer, Daniel; Schneider, Jochen M. |
| 刊名 | ACTA MATERIALIA
 |
| 出版日期 | 2019 |
| 卷号 | 165页码:615-625 |
| 关键词 | INITIO MOLECULAR-DYNAMICS AB-INITIO DEPENDENT STABILITY TRANSITION TIN COATINGS MICROSTRUCTURE NITRIDE SYSTEM GROWTH |
| DOI | 10.1016/j.actamat.2018.12.004 |
| 英文摘要 | Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/18552]  |
| 专题 | 2019专题 |
| 作者单位 | Chang, KK (reprint author), Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany. |
| 推荐引用方式 GB/T 7714 | Liu, Sida,Chang, Keke,Mraz, Stanislav,et al. Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films[J]. ACTA MATERIALIA,2019,165:615-625. |
| APA | Liu, Sida.,Chang, Keke.,Mraz, Stanislav.,Chen, Xiang.,Hans, Marcus.,...&Schneider, Jochen M..(2019).Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films.ACTA MATERIALIA,165,615-625. |
| MLA | Liu, Sida,et al."Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films".ACTA MATERIALIA 165(2019):615-625. |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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