ARPES/STM study of the surface terminations and 5f-electron character in URu2Si2
文献类型：期刊论文
| 作者 | Zhang, W; Lu, HY; Xie, DH; Feng, W; Tan, SY; Liu, Y; Zhu, XG; Zhang, Y; Hao, QQ; Huang, YB |
| 刊名 | PHYSICAL REVIEW B
 |
| 出版日期 | 2018 |
| 卷号 | 98期号:11页码:- |
| 关键词 | ELECTRON SUPERCONDUCTOR URU2SI2 HIDDEN-ORDER TRANSITION FERMI-SURFACE KONDO-LATTICE ITINERANT SPECTROSCOPY EXCITATIONS VALENCE STATE |
| ISSN号 | 2469-9950 |
| DOI | 10.1103/PhysRevB.98.115121 |
| 文献子类 | 期刊论文 |
| 英文摘要 | Hidden order in URu2Si2 has remained a mystery that is now entering its fourth decade. The importance of resolving the nature of the hidden order has stimulated extensive research. Here we present a detailed characterization of different surface terminations in URu2Si2 by angle-resolved photoemission spectroscopy, in conjunction with scanning tunneling spectroscopy and dynamical mean-field theory calculations that may unveil a piece of this puzzle. The U-terminated surface is characterized by an electronlike band around the (X) over bar point, while a holelike band characterizes the Si-terminated surface. We also investigate the temperature evolution of the electronic structure around the (X) over bar point from 11 up to 70 K, and do not observe any abrupt change of the electronic structure around the coherence temperature (55 K). The f spectral weight gradually weakens upon increasing temperature; still some f spectral weight can be found above this temperature. Our results suggest that surface terminations in URu2Si2 are an important issue to be taken into account in future work. |
| 语种 | 英语 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/30851]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 作者单位 | 1.Sci & Technol Surface Phys & Chem Lab, Mianyang 621908, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201204, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhang, W,Lu, HY,Xie, DH,et al. ARPES/STM study of the surface terminations and 5f-electron character in URu2Si2[J]. PHYSICAL REVIEW B,2018,98(11):-. |
| APA | Zhang, W.,Lu, HY.,Xie, DH.,Feng, W.,Tan, SY.,...&Chen, QY.(2018).ARPES/STM study of the surface terminations and 5f-electron character in URu2Si2.PHYSICAL REVIEW B,98(11),-. |
| MLA | Zhang, W,et al."ARPES/STM study of the surface terminations and 5f-electron character in URu2Si2".PHYSICAL REVIEW B 98.11(2018):-. |
入库方式： OAI收割
来源：上海应用物理研究所
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