中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Electrochemical Behavior of UO2F2 and Its Electrodeposition from UO2F2-FLiNaK Melt

文献类型:期刊论文

作者Han, D; She, CF; Peng, J; Jiang, F; Yang, X; Peng, H; Yang, Y; Zheng, HY; Wang, XB; Xu, QH
刊名JOURNAL OF THE ELECTROCHEMICAL SOCIETY
出版日期2018
卷号165期号:7页码:D301-D306
关键词MOLTEN-SALT REACTOR LIF-NAF-KF URANIUM SYSTEM SEPARATION FLUORIDES LICL
ISSN号0013-4651
DOI10.1149/2.0971807jes
文献子类期刊论文
英文摘要The electrochemical behavior of UO2F2 in LiF-NaF-KF (46.5-11.5-42 mol%, FLiNaK) melt on Pt electrode was investigated at 550 degrees C by cyclic voltammetry (CV) and square wave voltammetry (SWV). UO2F2 was prepared by the reaction of UF4 powder and oxygen at 650 degrees C, and ascertained by X-ray diffraction (XRD) and Raman spectroscopy. It was found that the reduction of UO22+ in FLiNaK exhibited two steps both with one exchanged electron: UO22+ + e(-)-> UO2(+) and UO2+ e(-) -> UO2 , with the CV reduction peak at about 2.02 V and 1.49 V (vs. K+/K), respectively. Both of them were reversible and diffusion-controlled. By means of potentiostatic electrolysis, the product of UO2 was obtained and the separation ratio of uranium from UO2F2-FLiNaK melt was approximately 54.5% at 550 degrees C, which were characterized by XRD and the inductively coupled plasma atomic emission spectrometer (ICP-AES). (C) The Author(s) 2018. Published by ECS.
语种英语
源URL[http://ir.sinap.ac.cn/handle/331007/30927]  
专题上海应用物理研究所_中科院上海应用物理研究所2011-2017年
作者单位1.Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China
2.Chinese Acad Sci, Ctr Excellence TMSR Energy Syst, Shanghai 201800, Peoples R China
3.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
推荐引用方式
GB/T 7714
Han, D,She, CF,Peng, J,et al. Electrochemical Behavior of UO2F2 and Its Electrodeposition from UO2F2-FLiNaK Melt[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY,2018,165(7):D301-D306.
APA Han, D.,She, CF.,Peng, J.,Jiang, F.,Yang, X.,...&Li, QN.(2018).Electrochemical Behavior of UO2F2 and Its Electrodeposition from UO2F2-FLiNaK Melt.JOURNAL OF THE ELECTROCHEMICAL SOCIETY,165(7),D301-D306.
MLA Han, D,et al."Electrochemical Behavior of UO2F2 and Its Electrodeposition from UO2F2-FLiNaK Melt".JOURNAL OF THE ELECTROCHEMICAL SOCIETY 165.7(2018):D301-D306.

入库方式: OAI收割

来源:上海应用物理研究所

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