Nitridated Ru/B4C multilayer mirrors with improved interface structure, zero stress, and enhanced hard X-ray reflectance
文献类型：期刊论文
| 作者 | Huang, QS; Liu, Y; Yang, Y; Qi, RZ; Feng, YF; Kozhevnikov, IV; Li, WB; Zhang, Z; Jiang, H; Zhang, L |
| 刊名 | OPTICS EXPRESS
 |
| 出版日期 | 2018 |
| 卷号 | 26期号:17页码:21803-21812 |
| 关键词 | THIN-FILMS PERFORMANCE ROUGHNESS |
| ISSN号 | 1094-4087 |
| DOI | 10.1364/OE.26.021803 |
| 文献子类 | 期刊论文 |
| 英文摘要 | Ru/B4C multilayer mirrors are used for hard X-ray monochromators with moderate spectral resolution and high integral flux. To overcome the problem of large compressive stress inherent in Ru/B4C multilayers, a reactive sputtering technique using a mixture working gas of argon and nitrogen with different partial pressures was tested. and the fabricated multilayers had a period of 3 nm. The intrinsic stress was essentially reduced after nitridation and relaxed to zero value at approximately 15% partial pressure of nitrogen in the working gas. Interface roughness was slightly increased which can be caused by the polycrystalline structure inside the nitridated samples. More importantly. the nitridated multilayers showed an enhanced reflectance (67% at 8.04 keV photon energy) as compared with the one fabricated with pure Ar (54%). The structure analysis with transmission electron microscopy and X-ray photoelectron spectroscopy demonstrated that nitrogen incorporated into a multilayer structure was mostly located in the B4C layers forming BN compounds, which suppressed the diffusion of boron, stabilized the interfaces and enhanced the reflectance. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement |
| 语种 | 英语 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/31044]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 作者单位 | 1.Tongji Univ, Inst Precis Opt Engn, Sch Phys Sci & Engn, Key Lab Adv Microstruct Mat,MOE, Shanghai 200092, Peoples R China 2.Russian Acad Sci, Shubnikov Inst Crystallog, Fed Sci Res Ctr Crystallog & Photon, Leninskiy Pr 59, Moscow 119333, Russia 3.Chinese Acad Sci, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys, Zhangheng Rd 239, Shanghai 201204, Peoples R China |
| 推荐引用方式 GB/T 7714 | Huang, QS,Liu, Y,Yang, Y,et al. Nitridated Ru/B4C multilayer mirrors with improved interface structure, zero stress, and enhanced hard X-ray reflectance[J]. OPTICS EXPRESS,2018,26(17):21803-21812. |
| APA | Huang, QS.,Liu, Y.,Yang, Y.,Qi, RZ.,Feng, YF.,...&Wang, ZS.(2018).Nitridated Ru/B4C multilayer mirrors with improved interface structure, zero stress, and enhanced hard X-ray reflectance.OPTICS EXPRESS,26(17),21803-21812. |
| MLA | Huang, QS,et al."Nitridated Ru/B4C multilayer mirrors with improved interface structure, zero stress, and enhanced hard X-ray reflectance".OPTICS EXPRESS 26.17(2018):21803-21812. |
入库方式： OAI收割
来源：上海应用物理研究所
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