The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF
文献类型：期刊论文
| 作者 | Xue, CF; Meng, XY; Wu, YQ; Wang, Y; Wang, LS; Yang, SM; Zhao, J; Tai, RZ |
| 刊名 | JOURNAL OF SYNCHROTRON RADIATION
 |
| 出版日期 | 2018 |
| 卷号 | 25期号:-页码:1869-1876 |
| 关键词 | INTERFEROMETRIC LITHOGRAPHY FABRICATION PERFORMANCE BAND |
| ISSN号 | 1600-5775 |
| DOI | 10.1107/S1600577518012833 |
| 文献子类 | 期刊论文 |
| 英文摘要 | A new spatially coherent beamline has been designed and constructed at the Shanghai Synchrotron Radiation Facility. Here, the design of the beamline is introduced and the spatial coherence is analyzed throughout the whole process by wave optics. The simulation results show good spatial coherence at the endstation and have been proven by experiment results. |
| 语种 | 英语 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/31146]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 作者单位 | 1.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xue, CF,Meng, XY,Wu, YQ,et al. The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF[J]. JOURNAL OF SYNCHROTRON RADIATION,2018,25(-):1869-1876. |
| APA | Xue, CF.,Meng, XY.,Wu, YQ.,Wang, Y.,Wang, LS.,...&Tai, RZ.(2018).The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF.JOURNAL OF SYNCHROTRON RADIATION,25(-),1869-1876. |
| MLA | Xue, CF,et al."The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF".JOURNAL OF SYNCHROTRON RADIATION 25.-(2018):1869-1876. |
入库方式： OAI收割
来源：上海应用物理研究所
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