Parallel direct writing achromatic talbot lithography: a method for large-area arbitrary sub-micron periodic nano-arrays fabrication
文献类型：期刊论文
| 作者 | Yang, SM; Xue, CF; Zhao, J; Wang, LS; Wu, YQ; Tai, RZ |
| 刊名 | NANOTECHNOLOGY
 |
| 出版日期 | 2019 |
| 卷号 | 30期号:31页码:— |
| 关键词 | BEAM INTERFERENCE LITHOGRAPHY RESOLUTION METAMATERIALS METASURFACE RESONANCES SPLITTER LIGHT ANGLE |
| ISSN号 | 0957-4484 |
| DOI | 10.1088/1361-6528/ab1108 |
| 文献子类 | 期刊论文 |
| 英文摘要 | Metasurfaces with complex periodic nanoarrays have attracted a large amount of attention over the past decades due to their pronounced plasmonic and photonic properties. Though various metasurface properties have been theoretically and experimentally investigated, the realization of practical metasurface applications remains a big challenge due to very limited large-area complex nanostructure fabrication. In this paper, we demonstrate a parallel direct writing achromatic Talbot lithography (DW-ATL) technique for large-area arbitrary sub-micron periodic nano-arrays fabrication. By using a laser interferometer, the sparse hole/dot arrays obtained by ATL could be stitched precisely between discrete multiple exposures. Complex sub-micron periodic nanoarrays, such as elliptical discs, rods, L-shaped and Y-shaped periodic nanoarrays, with a sub-hundred nm resolution were fabricated over an area of similar to mm(2). |
| 语种 | 英语 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/31751]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Synchrotron Radiat Facil, Shanghai Adv Res Inst, 239 Zhangheng Rd, Shanghai 201204, Peoples R China; 2.Chinese Acad Sci, Shanghai Inst Appl Phys, 2019 Jialuo Rd, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yang, SM,Xue, CF,Zhao, J,et al. Parallel direct writing achromatic talbot lithography: a method for large-area arbitrary sub-micron periodic nano-arrays fabrication[J]. NANOTECHNOLOGY,2019,30(31):—. |
| APA | Yang, SM,Xue, CF,Zhao, J,Wang, LS,Wu, YQ,&Tai, RZ.(2019).Parallel direct writing achromatic talbot lithography: a method for large-area arbitrary sub-micron periodic nano-arrays fabrication.NANOTECHNOLOGY,30(31),—. |
| MLA | Yang, SM,et al."Parallel direct writing achromatic talbot lithography: a method for large-area arbitrary sub-micron periodic nano-arrays fabrication".NANOTECHNOLOGY 30.31(2019):—. |
入库方式： OAI收割
来源：上海应用物理研究所
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