Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD
文献类型:期刊论文
作者 | Liao Chun-Jing; Dong Shao-Ming; Jin Xi-Hai; Hu Jian-Bao; Zhang Xiang-Yu; Wu Hui-Xia |
刊名 | JOURNAL OF INORGANIC MATERIALS |
出版日期 | 2019-11-20 |
卷号 | 34期号:11页码:1231 |
ISSN号 | 1000-324X |
关键词 | silicon nitride coating growth kinetic deposition temperature chemical composition heat treatment |
DOI | 10.15541/jim20190035 |
文献子类 | Article |
英文摘要 | Silicon nitride coatings on carbon fiber cloth were prepared by Low Pressure Chemical Vapor Deposition (LPCVD) from gas mixtures of SiCl4-NH3-H-2 at temperatures ranging from 750 degrees C to 1250 degrees C. The effects of deposition temperature on the growth kinetics, morphologies, chemical composition and bonding state of the coatings were investigated. The results showed that deposition rate increased monotonously with temperature up to 1050 , then it reversely decreased. In the whole temperature range, the coating surface morphology became gradually coarse with cauliflower-like grains as the deposition temperature increased. The optimal deposition temperature for infiltration was in the range between 750 and 950 degrees C. Chemical composition analysis demonstrated that the nitrogen content of the coating firstly decreased and then increased with temperature increase, while the silicon content continuously increased and the oxygen content gradually decreased in the whole temperature range. Heat treatment at 1300 degrees C and above crystallized the coating. Concurrently, a significant change in its surface morphology was observed. All heat-treated coatings were exclusively composed of alpha-Si3N4, without the presence of any beta-Si3N4. |
WOS研究方向 | Materials Science |
语种 | 英语 |
出版者 | SCIENCE PRESS |
源URL | [http://ir.sic.ac.cn/handle/331005/26726] |
专题 | 中国科学院上海硅酸盐研究所 |
推荐引用方式 GB/T 7714 | Liao Chun-Jing,Dong Shao-Ming,Jin Xi-Hai,et al. Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD[J]. JOURNAL OF INORGANIC MATERIALS,2019,34(11):1231. |
APA | Liao Chun-Jing,Dong Shao-Ming,Jin Xi-Hai,Hu Jian-Bao,Zhang Xiang-Yu,&Wu Hui-Xia.(2019).Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD.JOURNAL OF INORGANIC MATERIALS,34(11),1231. |
MLA | Liao Chun-Jing,et al."Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD".JOURNAL OF INORGANIC MATERIALS 34.11(2019):1231. |
入库方式: OAI收割
来源:上海硅酸盐研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。