Microstructures and residual strain/stresses of YSZ coatings prepared by plasma spraying
文献类型：期刊论文
| 作者 | Song, Xuemei; Zhang, Jimei; Lin, Chucheng; Liu, Ziwei; Jiang, Caifen; Kong, Mingguang; Zeng, Yi |
| 刊名 | MATERIALS LETTERS
 |
| 出版日期 | 2019-04-01 |
| 卷号 | 240页码:217 |
| 关键词 | YSZ coatings Deposition Microstructure Residual strain |
| ISSN号 | 0167-577X |
| DOI | 10.1016/j.matlet.2018.12.126 |
| 文献子类 | Article |
| 英文摘要 | Yttria-stabilized zirconia (YSZ) coatings containing equiaxed grains and columnar grains were prepared by plasma spraying. Electron backscatter diffraction (EBSD) technology was firstly conducted to investigate effects of the grain shape on residual strain/stresses in as-sprayed YSZ coatings. It was found that equiaxed grains have larger strain capabilities than columnar grains and YSZ coatings with more equiaxed grains exhibited greater residual stresses than those with more columnar grains. It might be attributed to the higher temperature gradients existing in equiaxed grains caused by a higher cooling rate. Therefore, YSZ thermal barrier coatings with more columnar grains have a longer lifetime, which might be attributed to lower residual stresses in the columnar grains. (C) 2019 Elsevier B.V. All rights reserved. |
| WOS研究方向 | Materials Science ; Physics |
| 语种 | 英语 |
| 出版者 | ELSEVIER SCIENCE BV |
| 源URL | [http://ir.sic.ac.cn/handle/331005/27244]  |
| 专题 | 中国科学院上海硅酸盐研究所 |
| 推荐引用方式 GB/T 7714 | Song, Xuemei,Zhang, Jimei,Lin, Chucheng,et al. Microstructures and residual strain/stresses of YSZ coatings prepared by plasma spraying[J]. MATERIALS LETTERS,2019,240:217. |
| APA | Song, Xuemei.,Zhang, Jimei.,Lin, Chucheng.,Liu, Ziwei.,Jiang, Caifen.,...&Zeng, Yi.(2019).Microstructures and residual strain/stresses of YSZ coatings prepared by plasma spraying.MATERIALS LETTERS,240,217. |
| MLA | Song, Xuemei,et al."Microstructures and residual strain/stresses of YSZ coatings prepared by plasma spraying".MATERIALS LETTERS 240(2019):217. |
入库方式： OAI收割
来源：上海硅酸盐研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。