化学水浴法和磁控溅射法制备硫化镉薄膜的性能研究
文献类型：期刊论文
| 作者 | 王胜利1; 王学进1; 王文忠3; 梁春军2; 王志3; 祁铮1 |
| 刊名 | 光谱学与光谱分析
 |
| 出版日期 | 2012 |
| 卷号 | 32期号:4页码:1094 |
| ISSN号 | 1000-0593 |
| 英文摘要 | Thin films of cadmium sulfide (CdS) were prepared with ammonium chloride, cadmium chloride, potassium hydroxide and thiourea by chemical bath deposition (CBD). For comparison, CdS films were also deposited by radio frequency (RF) magnetron sputtering, using CdS and argon as a target and reactive gas, respectively. The films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and ultraviolet-visible spectroscopy. The results show that the CAS films prepared by the above two methods have (002) orientation, the CdS films deposited by RF magnetron sputtering are more compact and much smoother than those prepared by CBD, and have lager crystalline size of about 20 similar to 30 nm. The CdS films prepared by CBD have smaller crystalline size and more defects. The properties of CdS thin films prepared by RF magnetron sputtering are totally superior to those of CdS films by CBD, but the optical transmittance of CdS thin films at short wavelength is an exception. The energy gap of CdS films prepared by the two methods are all in the range of 2.3 similar to 2.5 eV. |
| 语种 | 英语 |
| 源URL | [http://ir.ipe.ac.cn/handle/122111/35870]  |
| 专题 | 中国科学院过程工程研究所 |
| 作者单位 | 1.中国农业大学 2.北京交通大学 3.中国科学院过程工程研究所 |
| 推荐引用方式 GB/T 7714 | 王胜利,王学进,王文忠,等. 化学水浴法和磁控溅射法制备硫化镉薄膜的性能研究[J]. 光谱学与光谱分析,2012,32(4):1094. |
| APA | 王胜利,王学进,王文忠,梁春军,王志,&祁铮.(2012).化学水浴法和磁控溅射法制备硫化镉薄膜的性能研究.光谱学与光谱分析,32(4),1094. |
| MLA | 王胜利,et al."化学水浴法和磁控溅射法制备硫化镉薄膜的性能研究".光谱学与光谱分析 32.4(2012):1094. |
入库方式： OAI收割
来源：过程工程研究所
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