中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
半導体レーザ装置及びその製造方法

文献类型:专利

作者近藤 正樹; 佐々木 和明; 森本 泰司; 松本 晃広; 細羽 弘之; 松井 完益; 山本 三郎
发表日期1995-11-22
专利号JP1995109926B2
著作权人シャープ株式会社
国家日本
文献子类授权发明
其他题名半導体レーザ装置及びその製造方法
英文摘要PURPOSE:To prevent an active layer from being curved by a method wherein two subgrooves or more which do not penetrate a current stopping layer are formed in each of both sides of a striped groove. CONSTITUTION:An N-type GaAs layer which is used as a current stopping layer 2 is grown on a flat P-type GaAs substrate 1 and thereafter, a photoresist 9 is applied and a striped pattern is exposed and developed on the central part of the surface of the layer 2. Then, an etching is performed using a sulfuric etchant to form a main channel 10a and thereafter, a multitude of striped patterns are exposed and developed without removing the photoresist 9. Then, an etching is performed on the layer 2 to form dummy channels 10b. Then, the resist 9 is removed and a P-type GaAlAs clad layer 3 is formed. Then, a GaAlAs active layer 4, an N-type GaAlAs clad layer 5 and an N-type GaAs contact layer 6 are piled successively and after a heterostructure is formed, electrodes 8 and 7 are respectively formed on the rear of the substrate 1 and on the surface of the layer 6. Thereby, a thin layer is grown on both sides of a striped groove without curving the active layer over the groove and a semiconductor laser having a structure which can be easily manufactured can be obtained.
公开日期1995-11-22
申请日期1989-04-28
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/83271]  
专题半导体激光器专利数据库
作者单位シャープ株式会社
推荐引用方式
GB/T 7714
近藤 正樹,佐々木 和明,森本 泰司,等. 半導体レーザ装置及びその製造方法. JP1995109926B2. 1995-11-22.

入库方式: OAI收割

来源:西安光学精密机械研究所

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