中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor device

文献类型:专利

作者NAKAO ICHIROU; SHIBATA ATSUSHI; KIMURA SOUICHI
发表日期1985-07-01
专利号JP1985123083A
著作权人MATSUSHITA DENKI SANGYO KK
国家日本
文献子类发明申请
其他题名Semiconductor device
英文摘要PURPOSE:To improve light-receiving efficiency in a light-receiving section by forming the light-receiving section having the composition of a band gap the same as or smaller than the band gap of a semiconductor laser active layer. CONSTITUTION:Each layer of an n type InP clad layer 22, an un-doped InGaAsP active layer 23, a p type InP clad layer 24 and a p type InGaAsP cap layer 25 is grown on an n type InP substrate 21 in an epitaxial manner. Each layer is inverted-mesa etched, and each layer of a p type InP buried first layer 26, an n type InP buried second layer 27 and a p type InGaAsP buried third layer 28 is grown in the epitaxial manner. The band gap of the active layer 23 is made previously larger than that of the buried third layer 28 at that time. One part of the buried third layer 28 is removed through etching, and the buried second layer 27 is exposed. The buried third layer 28 between a semiconductor laser section 41 and a light-receiving element section 42 is etched selectively, insulating films 30 are sheped, and laser electrodes 31, 33 and light-receiving element electrodes 31, 32 are formed.
公开日期1985-07-01
申请日期1983-12-08
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/83522]  
专题半导体激光器专利数据库
作者单位MATSUSHITA DENKI SANGYO KK
推荐引用方式
GB/T 7714
NAKAO ICHIROU,SHIBATA ATSUSHI,KIMURA SOUICHI. Semiconductor device. JP1985123083A. 1985-07-01.

入库方式: OAI收割

来源:西安光学精密机械研究所

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