中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor laser

文献类型:专利

作者UMEDA JIYUNICHI; NAKAMURA MICHIHARU; AIKI KUNIO
发表日期1986-01-24
专利号JP1986016593A
著作权人HITACHI SEISAKUSHO KK
国家日本
文献子类发明申请
其他题名Semiconductor laser
英文摘要PURPOSE:To obtain a semiconductor laser, manufacture thereof is easy and an oscillation form thereof is stabilized and which has high reliability, with excellent reproducibility by forming a stepped section to the thickness of a semiconductor layer on at least a boundary between a light-emitting region and a section corresponding to regions except said region in at least one layer of second and third semiconductor layers having double hetero-structure. CONSTITUTION:A second semiconductor layer 12 with a projecting section, a first semiconductor layer 13 and a third semiconductor layer 14 are formed onto a substrate crystal 11 to which a recessed groove is shaped, and both sides of the first semiconductor layer 13 from which laser oscillation is generated are sandwiched by the second and third semiconductor layers 12, 14 having forbidden band width larger than the layer 13 and a refractive index smaller than the layer 13, thus shaping double hetero-structure in which carriers and photons are confined to the first semiconductor layer 13 at high density. The thickness of the second semiconductor layer 12 is reduced in an extent that one part of waveguide beams along the first semiconductor layer 13 is projected to the substrate 11 in a thin section, and made sufficiently larger than the thin section in thick sections. According to such structure, the titled laser functions as a value equivalent to a waveguide in which a refractive index is changed or the gain loss of beams is altered or both are varied in the (x) direction of a waveguide layer.
公开日期1986-01-24
申请日期1984-12-07
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/83732]  
专题半导体激光器专利数据库
作者单位HITACHI SEISAKUSHO KK
推荐引用方式
GB/T 7714
UMEDA JIYUNICHI,NAKAMURA MICHIHARU,AIKI KUNIO. Semiconductor laser. JP1986016593A. 1986-01-24.

入库方式: OAI收割

来源:西安光学精密机械研究所

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