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文献类型：专利
| 作者 | WADA OSAMU; NOBUHARA HIROYUKI |
| 发表日期 | 1989-10-23 |
| 专利号 | JP1989049029B2 |
| 著作权人 | FUJITSU LTD |
| 国家 | 日本 |
| 文献子类 | 授权发明 |
| 其他题名 | - |
| 英文摘要 | PURPOSE:To form mirrors flat and vertical in an optical meaning by a method wherein a wafer with a mask film covering the necessary part is tentatively fixed to a rotary table and then etched by irradiation with reactive ions or the like from the oblique direction while the rotary table is rotated on the axis of the direction parallel with the tentative-fixing surface. CONSTITUTION:Covered with a photo resist film 4 over the photosemiconductor element, a wafer 3 is tentatively fixed on the rotary table While a rotary shaft 2 fixed to the side surface of the rotary table 1 is rotated in the direction of an arrow 6, reactive ion beams 5 are made obliquely incident at an angle of phi to the surface of the wafer 3. Streaks are produced on the mirror surface 7 when the surface of the wafer 3 is almost opposed to the reactive ion beams 5, but as the wafer 3 rotates away off that state, the beams 5 come into irradiation from the side surfaces of the streaks and cut them away; the flat surface of the mirror surface 7 improves. Besides, suitable adjustment of the angle phiof incidence of the beams 5 improves the verticality of the mirror surface 7. |
| 公开日期 | 1989-10-23 |
| 申请日期 | 1984-10-18 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/84589]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | FUJITSU LTD |
| 推荐引用方式 GB/T 7714 | WADA OSAMU,NOBUHARA HIROYUKI. -. JP1989049029B2. 1989-10-23. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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