中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Integrated semiconductor optical waveguide device and fabrication methode

文献类型:专利

作者KIMURA, TATSUYA, C/O MITSUBISHI DENKI K.K; SHIGIHARA, KIMIO, C/O MITSUBISHI DENKI K.K; TAKEMOTO, AKIRA, C/O MITSUBISHI DENKI K.K; MITSUI, SHIGERU, C/O MITSUBISHI DENKI K.K
发表日期1996-02-14
专利号EP0696747A2
著作权人MITSUBISHI DENKI KABUSHIKI KAISHA
国家欧洲专利局
文献子类发明申请
其他题名Integrated semiconductor optical waveguide device and fabrication methode
英文摘要In an optical waveguide having one or more quantum well layers, the quantum well layer is put between by cladding layers having smaller refractive indices than that of the quantum well layer, and the quantum well layer having a portion of waveguiding light is put between by cladding layers having smaller refractive indices by disordering of the quantum well layer. Therefore, as compared with a BH (Buried Heterostructure) type or a ridge type optical waveguide, a planar type optical waveguide whose fabrication is easy and processing precision is improved is obtained.
公开日期1996-02-14
申请日期1995-08-08
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/84922]  
专题半导体激光器专利数据库
作者单位MITSUBISHI DENKI KABUSHIKI KAISHA
推荐引用方式
GB/T 7714
KIMURA, TATSUYA, C/O MITSUBISHI DENKI K.K,SHIGIHARA, KIMIO, C/O MITSUBISHI DENKI K.K,TAKEMOTO, AKIRA, C/O MITSUBISHI DENKI K.K,et al. Integrated semiconductor optical waveguide device and fabrication methode. EP0696747A2. 1996-02-14.

入库方式: OAI收割

来源:西安光学精密机械研究所

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