Integrated semiconductor optical waveguide device and fabrication methode
文献类型:专利
作者 | KIMURA, TATSUYA, C/O MITSUBISHI DENKI K.K; SHIGIHARA, KIMIO, C/O MITSUBISHI DENKI K.K; TAKEMOTO, AKIRA, C/O MITSUBISHI DENKI K.K; MITSUI, SHIGERU, C/O MITSUBISHI DENKI K.K |
发表日期 | 1996-02-14 |
专利号 | EP0696747A2 |
著作权人 | MITSUBISHI DENKI KABUSHIKI KAISHA |
国家 | 欧洲专利局 |
文献子类 | 发明申请 |
其他题名 | Integrated semiconductor optical waveguide device and fabrication methode |
英文摘要 | In an optical waveguide having one or more quantum well layers, the quantum well layer is put between by cladding layers having smaller refractive indices than that of the quantum well layer, and the quantum well layer having a portion of waveguiding light is put between by cladding layers having smaller refractive indices by disordering of the quantum well layer. Therefore, as compared with a BH (Buried Heterostructure) type or a ridge type optical waveguide, a planar type optical waveguide whose fabrication is easy and processing precision is improved is obtained. |
公开日期 | 1996-02-14 |
申请日期 | 1995-08-08 |
状态 | 失效 |
源URL | [http://ir.opt.ac.cn/handle/181661/84922] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | MITSUBISHI DENKI KABUSHIKI KAISHA |
推荐引用方式 GB/T 7714 | KIMURA, TATSUYA, C/O MITSUBISHI DENKI K.K,SHIGIHARA, KIMIO, C/O MITSUBISHI DENKI K.K,TAKEMOTO, AKIRA, C/O MITSUBISHI DENKI K.K,et al. Integrated semiconductor optical waveguide device and fabrication methode. EP0696747A2. 1996-02-14. |
入库方式: OAI收割
来源:西安光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。