Manufacture of diffraction grating
文献类型：专利
| 作者 | SUGIMOTO HIROSHI; MATSUI TERUHITO; OTSUKA KENICHI; ABE YUJI; OISHI TOSHIYUKI |
| 发表日期 | 1989-09-08 |
| 专利号 | JP1989225189A |
| 著作权人 | MITSUBISHI ELECTRIC CORP |
| 国家 | 日本 |
| 文献子类 | 发明申请 |
| 其他题名 | Manufacture of diffraction grating |
| 英文摘要 | PURPOSE:To easily form two types of diffraction gratings having twofold different periods from each other on the same substrate by etching by utilizing the difference of etching speeds of a part formed on a first diffraction grating body of a coating layer and its vicinity and a part formed on the substrate. CONSTITUTION:With a first resist 2 as a mask the substrate of the same period diffraction grating 6 is etched, a second resist 5 is removed, the grating 6 is covered with a third resist 7, and a first SiNx layer 3 is etched. In this case, it is rapidly etched as compared with a first SiNx layer 3 on the resist 2 and its vicinity on the substrate and the first SiNx layer 3 on the flat substrate Accordingly, a diffraction grating having a period of half of that of the diffraction grating of the resist 2 obtained by a double luminous flux interference exposure, composed of a repeated structure of the resist 2, the layer 3 not removed by etching and the part having no layer in a half period diffraction grating 4 is manufactured. Thus, the two types of the gratings having twofold different periods from each other are obtained on the same substrate by once double luminous flux interference exposure. |
| 公开日期 | 1989-09-08 |
| 申请日期 | 1988-03-03 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/86582]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | MITSUBISHI ELECTRIC CORP |
| 推荐引用方式 GB/T 7714 | SUGIMOTO HIROSHI,MATSUI TERUHITO,OTSUKA KENICHI,et al. Manufacture of diffraction grating. JP1989225189A. 1989-09-08. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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