Production of diffraction grating
文献类型：专利
| 作者 | TSUBOTA TAKASHI; HOSOI YOJI |
| 发表日期 | 1992-12-09 |
| 专利号 | JP1992356001A |
| 著作权人 | OKI ELECTRIC IND CO LTD |
| 国家 | 日本 |
| 文献子类 | 发明申请 |
| 其他题名 | Production of diffraction grating |
| 英文摘要 | PURPOSE:To obtain stable diffraction efficiency by forming the diffraction grating by etching a substrate until the specified shape of the diffraction grating is obtd. CONSTITUTION:The InP substrate 31 is coated with a photoresist film 32 and interference patterns of a prescribed pitch are exposed thereto by luminuous flux interference exposing. This resist film is then developed to form etching mask patterns 33 for forming the diffraction grating. The diffraction grating patterns 34 are thereafter transferred by a prescribed etching liquid. The etching time is about 30 seconds and the diffraction grating patterns 34 of a saw tooth wave are formed in this way. The etching mask patterns 33 are then removed. Further, an InP layer 35 is subjected to crystal growth by for example, a liquid growth method. This InP layer 35 is grown to the groove parts of the diffraction grating patterns 34 of the saw tooth shape. Then, the diffraction efficiency of the diffraction grating is controlled by the growth layer thickness of the InP layer 35. |
| 公开日期 | 1992-12-09 |
| 申请日期 | 1990-12-18 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/87158]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | OKI ELECTRIC IND CO LTD |
| 推荐引用方式 GB/T 7714 | TSUBOTA TAKASHI,HOSOI YOJI. Production of diffraction grating. JP1992356001A. 1992-12-09. |
入库方式： OAI收割
来源：西安光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。