中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Free standing quantum well structure

文献类型:专利

作者KNOX, WAYNE HARVEY; SHUNK, STEPHEN CASON; WILLIAMS, MICHAEL D.; ZUCKER, JANE ELISA
发表日期1995-02-01
专利号EP0637110A1
著作权人AT&T CORP.
国家欧洲专利局
文献子类发明申请
其他题名Free standing quantum well structure
英文摘要Conventional microfabrication techniques in conjunction with the precise growth of layers of single crystalline materials by epitaxial growth techniques allow the creation of electro-optic microstructures which achieve high reflectivity with only few periods of layer pairs. Standard lithographic techniques are utilized to fabricate free-standing quantum wells which are confined on both sides by air, acrylic resin, or vacuum. The quantum wells are fabricated from spatially and compositionally modulated III-V superlattices in which alternate layers of the structures are sacrificed by selective etching. The structures are patterned such that the quantum wells are suspended between support posts.
公开日期1995-02-01
申请日期1994-07-20
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/87331]  
专题半导体激光器专利数据库
作者单位AT&T CORP.
推荐引用方式
GB/T 7714
KNOX, WAYNE HARVEY,SHUNK, STEPHEN CASON,WILLIAMS, MICHAEL D.,et al. Free standing quantum well structure. EP0637110A1. 1995-02-01.

入库方式: OAI收割

来源:西安光学精密机械研究所

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