中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Manufacture of semiconductor laser device

文献类型:专利

作者HAMADA TAKESHI; SHIBUYA TAKAO; WADA MASARU; SHIMIZU YUICHI; ITO KUNIO; TERAMOTO IWAO
发表日期1986-02-28
专利号JP1986042187A
著作权人MATSUSHITA ELECTRIC IND CO LTD
国家日本
文献子类发明申请
其他题名Manufacture of semiconductor laser device
英文摘要PURPOSE:To enable the production of internal stripe lasers having the vertical groove side by the use of chemical etching by a method wherein a groove coming from top of a GaAlAs layer vertically down to the substrate is formed, and each layer containing the active layer is formed on the groove part. CONSTITUTION:An N type GaAs current stricture layer 2 is grown on the P type GaAs substrate (100)1 plane by liquid phase epitaxial growth. Next, a non- doped GaAlAs layer 10 is grown. Thereafter, the groove reaching the substrate 1 is formed in the surface through a phot mask 9 in parallel with the direction by chemical etching. After removal of the mask 9 and the layer 10, a clad layer 3, an active layer 4, a clad layer 5, and a cap layer 6 are successively grown, and an N-side ohmic electrode 7 and a P-side ohmic electrode 8 are formed by metal vapor deposition.
公开日期1986-02-28
申请日期1984-08-01
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/87735]  
专题半导体激光器专利数据库
作者单位MATSUSHITA ELECTRIC IND CO LTD
推荐引用方式
GB/T 7714
HAMADA TAKESHI,SHIBUYA TAKAO,WADA MASARU,et al. Manufacture of semiconductor laser device. JP1986042187A. 1986-02-28.

入库方式: OAI收割

来源:西安光学精密机械研究所

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