中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor laser element

文献类型:专利

作者IWAI NORIHIRO; MATSUMOTO SHIGETO
发表日期1992-10-28
专利号JP1992305991A
著作权人FURUKAWA ELECTRIC CO LTD:THE
国家日本
文献子类发明申请
其他题名Semiconductor laser element
英文摘要PURPOSE:To achieve a low cost and a high yield with the fabrication of a semiconductor laser element at a single crystal growth by superposing an active layer, which is constituted of a strain quantum well, on each of a plurality of ridges which are formed, differently from one another in width, on a semiconductor substrate. CONSTITUTION:Ridges 12a, 12b, 12c, and 12d are formed, differently from one another in width, on a substrate 1 Sequentially grown over the substrate are, in order, a cladding layer 13, an active layer 14 which is constituted of a triple strain quantum well, a cladding layer 15, and a contact layer 16. Then, the ridges 12a, 12b, 12c, and 12d are separated from one another by preparing, between them, grooves deep enough to reach the cladding layer 13. The SiNx layer 17 is further laid over the entirety of the uppermost layer. After the removal of the SiNx layer from the top of each ridge, that is, 12a, 12b, 12c, and 12d, both sides of the substrate are coated with electrode layers 18 and 19, respectively, whereby a semiconductor layer element can be fabricated at lower cost and higher yield.
公开日期1992-10-28
申请日期1991-04-02
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/87920]  
专题半导体激光器专利数据库
作者单位FURUKAWA ELECTRIC CO LTD:THE
推荐引用方式
GB/T 7714
IWAI NORIHIRO,MATSUMOTO SHIGETO. Semiconductor laser element. JP1992305991A. 1992-10-28.

入库方式: OAI收割

来源:西安光学精密机械研究所

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