中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Manufacture of semiconductor laser device

文献类型:专利

作者UNO TOMOAKI; SHIBATA ATSUSHI
发表日期1990-07-25
专利号JP1990188979A
著作权人MATSUSHITA ELECTRIC IND CO LTD
国家日本
文献子类发明申请
其他题名Manufacture of semiconductor laser device
英文摘要PURPOSE:To enable a production process to be simplified, an element characteristics to be uniform by using the crystal growth method of a gaseous phase for embedded crystal growth of a semiconductor laser device in a construction with a diffraction grating at the inside and to obtain an improved single vertical mode oscillation characteristics since the diffraction grating with a large coupling coefficient can be obtained. CONSTITUTION:A first semiconductor layer 2 of first conductive type, a second semiconductor layer 3 of first conductive type which becomes an active layer, a third semiconductor layer 4 of second conductive type which becomes a waveguide layer are subjected to epitaxial growth on a compound semiconductor substrate 1 of first conductive type in sequence and the surface of the semiconductor layer 4 is etched selectively for forming a diffraction grating 5. Then, after forming a laser resonator structure 6 of stripe shape by selectively etching the layer reaching the semiconductor layer 2 in vertical direction in reference to a groove of the diffraction grating 5, a fourth semiconductor layer 7 of second conductive type and a fifth semiconductor layer 8 of first conductive type are subjected to epitaxial growth by the crystal growth method of gaseous phase. Then, after performing etching from the upper part of the above laser resonator structure 6 to the semiconductor layer 7 selectively in stripe shape, a sixth semiconductor layer 10 of second conductive type is subjected to epitaxial growth.
公开日期1990-07-25
申请日期1989-01-17
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/88225]  
专题半导体激光器专利数据库
作者单位MATSUSHITA ELECTRIC IND CO LTD
推荐引用方式
GB/T 7714
UNO TOMOAKI,SHIBATA ATSUSHI. Manufacture of semiconductor laser device. JP1990188979A. 1990-07-25.

入库方式: OAI收割

来源:西安光学精密机械研究所

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