Method and apparatus for deposition of antireflection coatings and control of their thickness
文献类型：专利
| 作者 | LANDREAU, JEAN; NAKAJIMA, HISAO |
| 发表日期 | 1992-01-15 |
| 专利号 | EP0466598A1 |
| 著作权人 | FRANCE TELECOM |
| 国家 | 欧洲专利局 |
| 文献子类 | 发明申请 |
| 其他题名 | Method and apparatus for deposition of antireflection coatings and control of their thickness |
| 英文摘要 | The two faces (15-1, 15-2) of the amplifier (15) receive alternatively the evaporated material in small quantities. The semiconducting structure is supplied with a constant current (16) and the voltage (V) between the terminals of the structure is measured. When the coatings are deposited onto the two faces, the voltage increases and passes through a maximum corresponding to the reflectivity minimum. The deposition is then stopped. The two faces are treated in the same manner, with coatings of the same thickness. Application to the production of non-resonant optical amplifiers. |
| 公开日期 | 1992-01-15 |
| 申请日期 | 1991-07-11 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/88621]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | FRANCE TELECOM |
| 推荐引用方式 GB/T 7714 | LANDREAU, JEAN,NAKAJIMA, HISAO. Method and apparatus for deposition of antireflection coatings and control of their thickness. EP0466598A1. 1992-01-15. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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