中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor laser and method for fabricating the same

文献类型:专利

作者ISHIBASHI, AKIHIKO; KIDOGUCHI, ISAO; OHNAKA, KIYOSHI; MANNOU, MASAYA
发表日期1996-10-01
专利号US5561080
著作权人MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
国家美国
文献子类授权发明
其他题名Semiconductor laser and method for fabricating the same
英文摘要A semiconductor laser of the invention includes a (100) GaAs substrate having at least one stripe groove formed on an upper face thereof, and a semiconductor multilayer structure formed on the substrate. The stripe groove extends along a direction. The semiconductor multilayer structure includes an AlxGa1-x As layer (01), the portion being positioned on the stripe groove, a pair of AlGaInP cladding layers provided on the AlxGa1-xAs layer (0
公开日期1996-10-01
申请日期1995-03-01
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/88900]  
专题半导体激光器专利数据库
作者单位MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
推荐引用方式
GB/T 7714
ISHIBASHI, AKIHIKO,KIDOGUCHI, ISAO,OHNAKA, KIYOSHI,et al. Semiconductor laser and method for fabricating the same. US5561080. 1996-10-01.

入库方式: OAI收割

来源:西安光学精密机械研究所

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