中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor laser and a method for producing the same

文献类型:专利

作者KIDOGUCHI, ISAO; KAMIYAMA, SATOSHI; OHNAKA, KIYOSHI
发表日期1995-01-17
专利号US5383214
著作权人MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
国家美国
文献子类授权发明
其他题名Semiconductor laser and a method for producing the same
英文摘要A semiconductor laser including a semiconductor substrate and a multilayer structure formed upon the semiconductor substrate, the multilayer structure including an active layer, a pair of cladding layers between which the active layer is interposed, and a current confinement layer for injecting a current into a stripe-shaped predetermined region of the active layer. The current confinement layer comprises a first current blocking layer formed in regions thereof excluding a region corresponding to the predetermined region of the active layer. The first current blocking layer has a refractive index higher than a refractive index of the pair of cladding layers and an energy band gap larger than an energy band gap of the active layer.
公开日期1995-01-17
申请日期1993-07-15
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/88906]  
专题半导体激光器专利数据库
作者单位MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
推荐引用方式
GB/T 7714
KIDOGUCHI, ISAO,KAMIYAMA, SATOSHI,OHNAKA, KIYOSHI. Semiconductor laser and a method for producing the same. US5383214. 1995-01-17.

入库方式: OAI收割

来源:西安光学精密机械研究所

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